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摘要:
Measuring the aberrations of optical systems is an essential step in the fabrication of high precision optical components. Such a characterization is usually based on comparing the device under investigation with a calibrated reference object. However, when working at the cutting-edge of technology, it is increasingly difficult to provide an even better or well-known reference device. In this manuscript we present a method for the characterization of high numerical aperture microscope objectives, functioning without the need of calibrated reference optics. The technique constitutes a nanoparticle, acting as a dipole-like scatterer, that is placed in the focal volume of the microscope objective. The light that is scattered by the particle can be measured individually and serves as the reference wave in our system. Utilizing the well-characterized scattered light as nearly perfect reference wave is the main idea behind this manuscript.
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篇名 Absolute characterization of high numerical aperture microscope objectives utilizing a dipole scatterer
来源期刊 光:科学与应用(英文版) 学科
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年,卷(期) 2021,(12) 所属期刊栏目 Articles
研究方向 页码范围 2342-2348
页数 7页 分类号
字数 语种 英文
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光:科学与应用(英文版)
双月刊
2095-5545
22-1404/O4
吉林省长春市东南湖大路3888号
eng
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762
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