COPOLYMERS OF CHLOROETHYL METHACRYLATE, GLYCIDYL METHACRYLATE, AND METHYL METHACRYLATE AS SYNCHROTRON RADIATION x-RAY PHOTORESISTS

• 来源期刊: 高分子科学（英文版）
• 学科: 化学
• 年，卷（期）: 1998,（4）
• 页码范围: 304-309
• 页数: 6页
• 分类号: O6
• 语种: 英文

摘要

The copolymers of chloroethyl methacrylate (CMA), glycidyl methacrylate (GMA), and methyl methacrylate (MMA) were synthesized in benzene solution. Their breadths of the molecular weight distributions are 2.1 and 2.3, respectively. The thermal stability of P(GMA-CMA) is superior to that of P(CMA-MMA). The resolutions of P(CMA-MMA) and P(GMA-CMA) photoresists were found to be 0.1～0.16μm and 0.17 ～ 0.2 μm, respectively.