Structural properties of polycrystalline silicon films formed by pulsed rapid thermal processing

• 来源期刊: 中国物理（英文版）
• 学科: 物理学
• 关键词: polycrystalline silicon film rapid thermal processing microstructure
• 年，卷（期）: 2002,（5）
• 页码范围: 492-495
• 页数: 4页
• 分类号: O4
• 语种: 英文

摘要

A novel pulsed rapid thermal processing (PRTP) method has been used for realizing solid-phase crystallizationof amorphous silicon films prepared by plasma-enhanced chemical vapour deposition. The microstructure and surfacemorphology of the crystallized films were investigated using x-ray diffraction and atomic force microscopy. The resultsindicate that PRTP is a suitable post-crystallization technique for fabricating large-area polycrystalline silicon films withgood structural quality, such as large grain size, small lattice microstrain and smooth surface morphology on low-costglass substrates.