Barrier Formation on a YBa2Cu3Oy Thin Film Using CF4 Plasma Fluorination

• 来源期刊: 中国物理快报（英文版）
• 学科: 物理学
• 年，卷（期）: 2002,（6）
• 页码范围: 850-853
• 页数: 4页
• 分类号: O4
• 语种: 英文

摘要

We investigate the surface structure and composition ofa YBa2Cu3Oy (YBCO) thin film modified by CF4 plasma fluorination. In addition to the absorption of hydrocarbons, chemical reactions of the YBCO surface take place during CF4 plasma treatment. Various x-ray photoelectron spectroscopic data are reported and discussed. The existence of a thin barrier is confirmed, which homogeneously covers the edge of the base YBCO film in our interface engineering Josephson junction. Measurements of Auger electron spectroscopic data and the resistance versus temperature indicate that the barrier is a controllable-insulating layer.