An electron moiré method for a common SEM

• 来源期刊: 力学学报（英文版）
• 年，卷（期）: 2006,（6）
• 页码范围: 595-602
• 页数: 8页
• 语种: 英文

摘要

In the electron moiré method,a high-frequency grating is used to measure microscopic deformation,which promises significant potential applications for the method in the microscopic analysis of materials.However,a special beam scanning control device is required to produce a grating and generate a moiré fringe pattern for the scanning electron microscope (SEM).Because only a few SEMs used in the material science studies are equipped with this device,the use of the electron moiré method is limited.In this study,an electron moiré method for a common SEM without the beam control device is presented.A grating based on a multi-scanning concept is fabricated in any observing mode.A real-time moiré pattern can also be generated in the SEM or an optical filtering system.Without the beam control device being a prerequisite,the electron moiré method can be more widely used.The experimental results from three different types of SEMS show that high quality gratings with uniform lines and less pitch error can be fabricated by this method,and moiré patterns can also be correctly generated.