Light induced microstructure transformation in a-Si:H films

• 来源期刊: 中国物理（英文版）
• 关键词: hydrogenated amorphous silicon Staebler-Wronski effect microwave electron cyclotron resonant chemical vapour deposition
• 年，卷（期）: 2007,（4）
• 页码范围: 1125-1128
• 页数: 4页
• 语种: 英文

摘要

A series of a-Si∶H films are deposited by hot wire assisted microwave electron cyclotron resonant chemical vapour deposition (HW-MWECR-CVD), subsequently exposed under simulated illumination for three hours. This paper studies the microstructure change during illumination by Fourier Transformation Infrared (FTIR) spectra. There are two typical transformation tendencies of microstructure after illumination. It proposes a model of light induced structural change based on the experimental results. It is found that all samples follow the same mechanism during illumination, and intrinsic structure of samples affect the total H content.