Electron field emission characteristics of nano-catkin carbon films deposited by electron cyclotron resonance microwave plasma chemical vapour deposition

• 来源期刊: 中国物理B（英文版）
• 关键词: field emission carbon films nano-catkin microwave plasma chemical vapour deposition
• 年，卷（期）: 2008,（2）
• 页码范围: 716-720
• 页数: 5页
• 语种: 英文

摘要

This paper reported that the nano-catkin carbon films were prepared on Si substrates by means of electron cyclotron resonance microwave plasma chemical vapour deposition in a hydrogen and methane mixture.The surface morphology and the structure of the fabricated films were characterized by using scanning electron microscopes and Raman spectroscopy,respectively.The stable field emission properties with a low threshold field of 5V/μm corresponding to a current density of about 1μA/cm2 and a current density of 3.2mA/cm2 at an electric field of 10V/μm were obtained from the carbon film deposited at CH4 concentration of 8%.The mechanism that the threshold field decreased with the increase of the CH4 concentration and the high emission current appeared at the high CH4 concentration was explained by using the Fowler-Nordheim theory.