All-reflective optical system design for extreme ultraviolet lithography

• 来源期刊: 中国光学快报(英文版)
• 学科: 工学
• 关键词: 光学系统设计 光刻技术 超紫外线 反光 反射光学系统 投影光刻物镜 优化布局 极紫外光刻
• 年，卷（期）: 2010,（11）
• 页码范围: 1082-1084
• 页数: 3页
• 分类号: TN305.7 TH740.2
• 语种: 英文

摘要

All-reflective optical systems,due to their material absorption and low refractive index,are used to create the most suitable devices in extreme ultraviolet lithography (EUVL).In this letter,we present a design for an all-reflective lithographic projection lens.We also discuss its design idea and structural system.After analysis of the four-mirror optical system,the initial structural parameters are determined,the optical system is optimized,and the tolerances of the system are analyzed.We also show the implementation of optimal layout and desired imaging performance.