Characterization of Thin Films by Low Incidence X-Ray Diffraction

• 作者: Mirtat Bouroushian Tatjana Kosanovic
• 来源期刊: 晶体结构理论与应用(英文)
• 学科: 化学
• 关键词: Glancing Angle X-Ray DIFFRACTION Thin films Titanium OXIDES Metal CHALCOGENIDES ELECTRODEPOSITION
• 年，卷（期）: 2012,（3）
• 页码范围: 35-39
• 页数: 5页
• 分类号: O6

摘要

Glancing Angle X-ray Diffraction (GAXRD) is introduced as a direct, non-destructive, surface-sensitive technique for analysis of thin films. The method was applied to polycrystalline thin films (namely, titanium oxide, zinc selenide, cadmium selenide and combinations thereof) obtained by electrochemical growth, in order to determine the composition of ultra-thin surface layers, to estimate film thickness, and perform depth profiling of multilayered heterostructures. The experimental data are treated on the basis of a simple absorption-diffraction model involving the glancing angle of X-ray incidence.