Magnetic performance and corrosion resistance of electroless plating CoWP film

• 来源期刊: 稀有金属(英文版)
• 学科: 工学
• 年，卷（期）: 2012,（3）
• 页码范围: 264-271
• 页数: 8页
• 分类号: TG174.44
• 语种: 中文

摘要

The CoWP film with good magnetic performance and corrosion resistance was electrolessly plated from alkaline solution. The technical parameters of the electroless plating system were optimized. When the pH value of electroless plating solution was 11.0 and the reducing agent (NaH2PO2) content was 0.4 mol L 1, the target chemical reactions proceeded in the electroless plating solution smoothly with negligible interference and side effects. CoWP film prepared under optimal deposition condition contained more hexagonal close-packed (hcp) cobalt (ε-Co) of [110] and crystallographic orientation of Co [002]. VSM analysis reveals that the saturation magnetization of the CoWP film is 100~220 Am2 kg 1 and coercivity is (2.87~4.38)*104 A·cm 1. The corrosion behavior of CoWP film in 3.5% NaCl aqueous solution was studied by electrochemical experiments. The results prove that the corrosion resistance of the CoWP film deposited under the optimal depo-sition condition exhibites relatively lower corrosion current of (3.054~3.162)*10 6 A·cm 2. The surface morphology analysis indicates that the film is smooth and composed of regular-shaped crystallites.