Ultrathin Carbon Films Prepared by Negative Cluster-Beam Technology

• 来源期刊: 中国物理快报（英文版）
• 年，卷（期）: 2012,（7）
• 页码范围: 265-267
• 页数: 3页
• 语种: 英文
• DOI: 10.1088/0256-307X/29/7/078101

摘要

We develop a miniaturized chamber installed on a tandetron accelerator into which negative ions of small carbon clusters are transported.Negative clusters C-1-C-10 are obtained with beam currents of 1-104 nA at energies of l0-20keV.C-2 beams of 0.2μA are used to directly deposit carbon films on SiO2/Si substrates.Formation of ultrathin carbon films are demonstrated by Raman scattering,which reveals the evolution of the graphitic peak (1550cm-2) with deposition time.