Adjustment of residual stress and intermediate layer to BDD/porous Ti composite membrane

• 来源期刊: 光电子快报(英文版)
• 学科: 工学
• 年，卷（期）: 2013,（3）
• 页码范围: 189-193
• 页数: 5页
• 分类号: TN304.055
• 语种: 中文

摘要

Diamond films are deposited on porous Ti substrates by hot filament chemical vapor deposition (HFCVD) method. For adjusting the residual stress of substrate and the titanium carbide (TiC) intermediate layer, the substrates are under annealing process firstly, then are put into alkaline solution with electricity oxidation, and finally composite membranes are obtained by HFCVD, which are characterized by X-ray diffraction (XRD), metalloscope and scanning electron microscope (SEM). Results show that the composite membranes deposited on unannealed substrates are cracked obviously in both sides and broken off easily. After annealing process, the membranes are no longer cracked easily, because the tensile stress distributed in substrates is significantly relieved. After passivation process, TiC generated between diamond film and substrate is less than that without passivation process.