Repetition rate dependence of absorption of fused silica irradiated at 193 nm

• 来源期刊: 中国光学快报（英文版）
• 年，卷（期）: 2013,（5）
• 页码范围: 69-71
• 页数: 3页
• 语种: 英文
• DOI: 10.3788/COL201311.053002

摘要

Repetition rate-dependent absorbance measurements of synthetic fused silica at 193-nm irradiation are performed in the range of 50-1 000 Hz with an ArF laser calorimeter.The "apparent" single-and twophoton absorption coefficients are determined by measuring the laser fluence-dependent absorbance of fused silica samples with different thicknesses to separate the surface absorption and bulk absorption.The measurement results indicate a reversible nonlinear increase of both apparent single-and two-photon absorption coefficients with increasing repetition rate for the synthetic fused silica,whereas the surface absorption shows no dependence on the repetition rate.