Multilayers with high-reflectivity at 19.5 nm and low-reflectivity at 30.4 nm

• 来源期刊: 中国光学快报（英文版）
• 年，卷（期）: 2013,（z1）
• 页码范围: 154-157
• 页数: 4页
• 语种: 英文
• DOI: 10.3788/COL201311.S10606

摘要

The multilayer (ML) mirror with high-reflectivity (HR) at a specific emission line of 19.5 nm (Fe line) and low-reflectivity (LR) at 30.4 nm (He line) is needed to be designed and fabricated for observing the image of sun.Based on a variety of optimizations utilized different structures,the design is performed and the final results demonstrate that the reflectivity at 30.4 nm does not achieve minimum value when the reflectivity at 19.5 nm reaches the maximum value.The tradeoff should be done between the HR at 19.5 nm and LR at 30.4 nm.One optimized mirror is fabricated by direct current magnetron sputtering and characterized by grazing-incident X-ray diffraction (XRD) and synchrotron radiation (SR).The experimental results demonstrate that the ML achieves the reflectivity of 33.3％ at 19.5 nm and of 9.6×10-4 at 30.4 nm at the incident angle of 13°.