Mechanisms of near-ultraviolet,nanosecond-pulse-laser damage in HfO2/SiO2-based multilayer coatings
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摘要:
The possible role of metal clusters and electronic defects in the near-ultraviolet,nanosecond-pulse-laser damage in HfO2/SiO2-pair-based coatings is analyzed using experimental results on absorption and damage in HfO2 monolayers with and without artificially introduced Hf nanoscale absorbers.These studies reveal a damage mechanism specific to HfO2/SiO2 pair combination comprised of a high-melting-point material (HfO2),where absorption starts,and a lower-melting-point material (SiO2),where absorption can be initiated upon reaching the critical temperature.Based on this analysis we discuss possible modifications to coating designs and desirable properties of high-and low-index materials that might lead to improve nanosecond,near-ultraviolet laser-damage performance.