Evolution of Residual Stress and Structure in YSZ/SiO2 Multilayers with Different Modulation Ratios

• 来源期刊: 中国物理快报（英文版）
• 年，卷（期）: 2013,（2）
• 页码范围: 118-120
• 页数: 3页
• 语种: 英文
• DOI: 10.1088/0256-307X/30/2/024206

摘要

Multilayer (ML) systems are widely used for a variety of optical practical applications and are generally composed of alternating layers of two materials having high and low refractive index,respectively.[1-3]The residual stress of MLs in optical systems structures influences their mechanical properties and performance,which must be characterized and ultimately controlled.For instance,excessive residual stresses in thin films may canse bending of the substrate or peeling of the films,even more adhesion failures and mechanical damage.[4-6] Meanwhile,in order to improve output beam quality in a precise optical element and large-scale optical system,the coated optical element figure must be kept flat,which may be of critical importance for reflected wavefront aberration in optical apparatus caused by surface distortion.