Crystallization Kinetics Study on Magnetron-Sputtered Amorphous TiAl Alloy Thin Films

• 来源期刊: 中国物理快报（英文版）
• 年，卷（期）: 2014,（4）
• 页码范围: 100-104
• 页数: 5页
• 语种: 英文
• DOI: 10.1088/0256-307X/31/4/046103

摘要

Crystallization kinetics of magnetron-sputtered amorphous TiAI alloy thin films is investigated by differential scanning calorimetry through isothermal analysis and non-isothermal analysis.In non-isothermal analysis,the Kissinger method and the Ozawa method are used to calculate the apparent activation energy and local activation energy,respectively,in the crystallization processes of amorphous TiAl thin films.Furthermore,the crystallization mechanism is discussed from the investigation of the A vrami exponent by isothermal analysis.In addition,x-ray diffraction is utilized to reveal the grain orientation and evolution during the crystallization of TiAl thin films.