Influences of different oxidants on characteristics of La2O3/Al2O3 nanolaminates deposited by atomic layer deposition

• 来源期刊: 中国物理B（英文版）
• 关键词: La2O3/Al2O3 nanolaminates atomic layer deposition oxidants annealing
• 年，卷（期）: 2017,（6）
• 页码范围: 395-400
• 页数: 6页
• 语种: 英文
• DOI: 10.1088/1674-1056/26/6/067701

摘要

A comparative study of two kinds of oxidants (H2O and O3) with the combination of two metal precursors (TMA and La(iprCp)3) for atomic layer deposition (ALD) La2O3/Al2O3 nanolaminates is carried out.The effects of different oxidants on the physical properties and electrical characteristics of La2O3/Al2O3 nanolaminates are studied.Initial testing results indicate that La2O3/Al2O3 nanolaminates could avoid moisture absorption in the air after thermal annealing.However,moisture absorption occurs in H2O-based La2O3/Al2O3 nanolaminates due to the residue hydroxyl/hydrogen groups during annealing.As a result,roughness enhancement,band offset variation,low dielectric constant and poor electrical characteristics are measured because the properties of H2O-based La2O3/Al2O3 nanolaminates are deteriorated.Addition thermal annealing effects on the properties of O3-based La2O3/Al2O3 nanolaminates indicate that O3 is a more appropriate oxidant to deposit La2O3/Al2O3 nanolaminates for electron devices application.