Micro-channel etching characteristics enhancement by femtosecond laser processing high-temperature lattice in fused silica glass

• 来源期刊: 中国光学快报（英文版）
• 年，卷（期）: 2017,（7）
• 页码范围: 56-59
• 页数: 4页
• 语种: 英文
• DOI: 10.3788/COL201715.071403

摘要

A fused silica glass micro-channel can be formed by chemical etching after femtosecond laser irradiation,and the successful etching probability is only 48％.In order to improve the micro-channel fabrication success probability,the method of processing a high-temperature lattice by a femtosecond laser pulse train is provided.With the same pulse energy and scanning speed,the success probability can be increased to 98％ by optimizing pulse delay.The enhancement is mainly caused by the nanostructure,which changes from a periodic slabs structure to some intensive and loose pore structures.In this Letter,the optimum pulse energy distribution ratio to the etching is also investigated.