Metre-size single-crystal graphene becomes a reality

• 来源期刊: 科学通报（英文版）
• 年，卷（期）: 2017,（15）
• 页码范围: 1039-1040
• 页数: 2页
• 语种: 英文

摘要

Prof.Zhongfan Liu of Peking University,a well-known graphene researcher and also one of the authors for the work [1] highlighted here,has always said,"Fabrication determines the future".I agree.The growth of large-area high-quality graphene films is essential for the various uses of graphene materials in device applications.Generally,the chemical vapour deposition (CVD) method has been widely accepted as the most promising one for the mass production of high-quality graphene thin films.Many substrates have been used,such as Cu [2-5],Pt [6],Ru [7],Ge [8],Cu-Ni alloy [9],and Ni-Mo alloy [10].Among them,due to its industrial supply,its low price and low carbon solubility to produce monolayer graphene,a Cu substrate is believed to have the brightest future to producing high-quality graphene films on the industrial level.However,the graphene films grown on commercially-available Cu foils are usually polycrystalline with grain boundaries,which significantly degrades the quality of graphene.