Enhancement of laser ablation via interacting spatial double-pulse effect

• 来源期刊: 光电进展（英文版）
• 年，卷（期）: 2018,（8）
• 页码范围: 7-12
• 页数: 6页
• 语种: 中文
• DOI: 10.29026/oea.2018.180014

摘要

A novel spatial double-pulse laser ablation scheme is investigated to enhance the processing quality and efficiency for nanosecond laser ablation of silicon substrate. During the double-pulse laser ablation, two splitted laser beams simulta-neously irradiate on silicon surface at a tunable gap. The ablation quality and efficiency are evaluated by both scanning electron microscope and laser scanning confocal microscope. As tuning the gap distance, the ablation can be signifi-cantly enhanced if the spatial interaction between the two splitted laser pulses is optimized. The underlying physical mechanism for the interacting spatial double-pulse enhancement effect is attributed to the redistribution of the integrated energy field, corresponding to the temperature field. This new method has great potential applications in laser microm-achining of functional devices at higher processing quality and faster speed.