Effect of Nickel Distributions Embedded in Amorphous Carbon Films on Transport Properties

• 来源期刊: 中国物理快报（英文版）
• 年，卷（期）: 2018,（2）
• 页码范围: 61-65
• 页数: 5页
• 语种: 英文
• DOI: 10.1088/0256-307X/35/2/026501

摘要

Electrical properties of C/Ni films are studied using four mosaic targets made of pure graphite and stripes of nickel with the surface areas of 1.78,3.21,3.92 and 4.64％.The conductivity data in the temperature range of 400-500 K shows the extended state conduction.The conductivity data in the temperature range of 1500300K shows the multi-phonon hopping conduction.The Berthelot-type conduction dominates in the temperature range of 50-150K.The conductivity of the films in the temperature range about T ＜ 50K is described in terms of variable-range hopping conduction.In low temperatures,the localized density of state around Fermi level N (EF)for the film deposition with 3.92％ nickel has a maximum value of about 56.2 × 1017 cm-3eV-1 with the minimum average hopping distance of about 3.43 × 10-6 cm.