基本信息来源于合作网站,原文需代理用户跳转至来源网站获取       
摘要:
A practical 2.45-GHz microwave-driven Cs-free H? source was improved based on the experimental H? source at Peking University (PKU). Several structural improvements were implemented to meet the practical requirements of Xi'an Proton Application Facility (XiPaf). Firstly, the plasma chamber size was optimized to enhance the plasma intensity and stability. Secondly, the filter magnetic field and electron deflecting magnetic field were enhanced to reduce co-extracted electrons. Thirdly, a new two-electrode extraction system with farther electrode gap and enhanced water cooling ability to diminish spark and sputter during beam extraction was applied. At last, the direct H? current measuring method was adopted by the arrangement of a new pair of bending magnets before Faraday cup (FC) to remove residual electrons. With these improvements, electron cyclotron resonance (ECR) magnetic field optimization experiments and operation parameter variation experiments were carried out on the H?ion source and a maximum 8.5-mA pure H?beam was extracted at 50 kV with the time structure of 100 Hz/0.3 ms. The root-mean-square (RMS) emittance of the beam is 0.25π·mm·mrad. This improved H?source and extraction system were maintenance-free for more than 200 hours in operation.
推荐文章
期刊_丙丁烷TDLAS测量系统的吸收峰自动检测
带间级联激光器
调谐半导体激光吸收光谱
雾剂检漏 中红外吸收峰 洛伦兹光谱线型
期刊_联合空间信息的改进低秩稀疏矩阵分解的高光谱异常目标检测
高光谱图像
异常目标检测 低秩稀疏矩阵分解 稀疏矩阵 残差矩阵
内容分析
关键词云
关键词热度
相关文献总数  
(/次)
(/年)
文献信息
篇名 Practical 2.45-GHz microwave-driven Cs-free H?ion source developed at Peking University
来源期刊 中国物理B(英文版) 学科
关键词 electron cyclotron resonance (ECR) ion source hydrogen plasma negative ion beam plasma ap-plication
年,卷(期) 2018,(10) 所属期刊栏目
研究方向 页码范围 425-432
页数 8页 分类号
字数 语种 英文
DOI 10.1088/1674-1056/27/10/105208
五维指标
传播情况
(/次)
(/年)
引文网络
引文网络
二级参考文献  (0)
共引文献  (0)
参考文献  (0)
节点文献
引证文献  (0)
同被引文献  (0)
二级引证文献  (0)
2018(0)
  • 参考文献(0)
  • 二级参考文献(0)
  • 引证文献(0)
  • 二级引证文献(0)
研究主题发展历程
节点文献
electron cyclotron resonance (ECR) ion source
hydrogen plasma
negative ion beam
plasma ap-plication
研究起点
研究来源
研究分支
研究去脉
引文网络交叉学科
相关学者/机构
期刊影响力
中国物理B(英文版)
月刊
1674-1056
11-5639/O4
北京市中关村中国科学院物理研究所内
eng
出版文献量(篇)
17050
总下载数(次)
0
总被引数(次)
27962
  • 期刊分类
  • 期刊(年)
  • 期刊(期)
  • 期刊推荐
论文1v1指导