Optimal Design of Co/In/Cu Sputtering Target Assembly Using Finite Element Method and Taguchi Method

• 来源期刊: 金属学报（英文版）
• 年，卷（期）: 2019,（11）
• 页码范围: 1407-1414
• 页数: 8页
• 语种: 英文

摘要

Target assembly is a key consumable material for producing thin film used in the electronic packaging and devices.The residual stresses induced during the process of soldering are detrimental to the performance of target assembly.In this work,the intensity and distribution of the soldering residual stress of Co/In/Cu target assembly subjected to a 20 W/(m2 K) cooling condition corresponding to the actual air cooling process were studied,based on finite element simulation and Taguchi method,to optimize the sputtering target assembly.Effects of different control factors,including solder material,thickness of solder layer,target and backing plate,on the soldering residual stress of target assembly are investigated.The maximum residual stress is calculated as 9.28 MPa in the target located at 0.16 mm from target-solder layer interface and at a distance of 0.78 mm from symmetry axis.The optimal design in target assembly has the combination of indium solder material,cobalt target at 12 mm thick,solder layer at 0.8 mm thick,copper backing plate at 15 mm thick.Moreover,solder material is the most important factor among control factors in the target assembly.