Vapor-assisted epitaxial growth of porphyrin-based MOF thin film for nonlinear optical limiting

• 作者: Jian Zhang Yi-Hong Xiao Zhi-Gang Gu
• 来源期刊: 中国科学:化学（英文版）
• 年，卷（期）: 2020,（8）
• 所属期刊栏目: ARTICLES
• 页码范围: 1059-1065
• 页数: 7页
• 语种: 英文

摘要

Fabrication of metal-organic frameworks (MOFs) thin films has been an efficient way to expand their functionalities and applications.Here,we use the vapor-assisted deposition (VAD) method to epitaxially grow a porphyrin-based MOF PCN-222 film.That is,vapor source assists to deposit pre-treated precursor solution on quartz substrate to form a continuous PCN-222 film.Furthermore,utilizing the post-treated encapsulation of functional carbon-based nanoparticles,the carbon nanodots (CND)and Pt doped CND (Pt/CND) are well loaded into the pores of PCN-222 film,the size (～3.1 nm) of which is highly close to the pore size of the corresponding MOF (～3.7 nm).The Z-scan results reveal that PCN-222 film exhibits high reverse saturable absorption.In addition,encapsulation of carbon based nanodots into PCN-222 film could enhance the nonlinear optical limiting effect benefiting from the host-guest combination.This study serves to present both the available toolbox of thin film preparation and high potential for precise synthetic nanocomposite films in optical limiting devices.