Near vacuum-ultraviolet aperiodic oscillation emission of AlN films
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摘要:
An accurate measurement of the refractive index is necessary for the optical design of both deep ultraviolet laser diodes and light-emitting diodes.Generally,the refractive indices along different crystallographic axes of anisotropic thin films are measured using variable angle spectroscopic ellipsometry.However,there are still some limitations concerning this method.Here we proposed a potential method to measure the band edge refractive index of wide bandgap semiconductor.An aperiodic oscillation emission phenomenon due to the Fabry-Perot effect was observed in the fluorescence spectrum of an AlN film with a thickness of 1500 nm.Based on the characteristics of the fluorescence spectrum and the definition of Fabry-Perot effect,we obtained the ordinary refractive index of the AlN thin film near the band edge directly.This refractive index measurement method is a supplement to the variable angle ellipsometry,and it is a more direct and effective method for transferred film and thinner samples to measure the fluorescence spectrum.