The accelerating nanoscale Kirkendall effect in Co films-native oxide Si (100) system induced by high magnetic fields

• 作者: Guojian Li Kai Wang Qiang Wang Shuang Yuan Yonghui Ma Yue Zhao
• 来源期刊: 材料科学技术（英文版）
• 年，卷（期）: 2020,（11）
• 页码范围: 127-135
• 页数: 9页
• 语种: 英文

摘要

The morphology evolution and magnetic properties of Co films-native oxide Si (100) were investigated at 873,973,and 1073 K in a high magnetic field of 11.5 T.Formation of Kirkendall voids in the Co films was found to cause morphology evolution due to the difference in diffusion flux of Co and Si atoms through the native oxide layer.The high magnetic fields had considerable effect on the morphology evolution by accelerating nanoscale Kirkendall effect.The diffusion mechanism in the presence of high magnetic fields was given to explain the increase of diffusion coefficient.The morphology evolution of Co films on native oxide Si (100) under high magnetic fields during annealing resulted in the magnetic properties variation.

作者信息

序号	姓名	单位	发文数	被引次数	H指数	G指数
1	Kai Wang	中国科学院金属研究所	3	0	0.0	0.0
2	Qiang Wang	中国科学院金属研究所	3	0	0.0	0.0
3	Yue Zhao	中国科学院金属研究所	1	0	0.0	0.0
4	Shuang Yuan	中国科学院金属研究所	1	0	0.0	0.0
5	Yonghui Ma	中国科学院金属研究所	1	0	0.0	0.0
6	Guojian Li	中国科学院金属研究所	1	0	0.0	0.0