【正】 Y2002-63234-11 0224630铜-化学机械抛光工艺用清洁室设计=Cleanroom de-sign for Cu-CMP processes[会,英]/Ishiguro,T.& Ro,T.//2001 IEEE International Symposium on Semicon-ductor Manufacturing.—11~14(E)Y2002-63234-71 0224631半导体制造中工艺过程分析动态模拟器=Dynamicsimulator for WIP analysis in semiconductor manulactur-ing[会,英]/Collins,D.W.& Lakshrnan//2001 IEEE