Structures and electronic properties of domain walls in BiFeO3 thin films

• 作者: Christopher Addiego Huaixun Huyan Linze Li Wenpei Gao Xiaoqing Pan
• 来源期刊: 国家科学评论（英文版）
• 年，卷（期）: 2019,（4）
• 页码范围: 669-683
• 页数: 15页
• 语种: 英文
• DOI: 10.1093/nsr/nwz101

摘要

Domain walls (DWs) in ferroelectrics are atomically sharp and can be created, erased, and reconfigured within the same physical volume of ferroelectric matrix by external electric fields. They possess a myriad of novel properties and functionalities that are absent in the bulk of the domains, and thus could become an essential element in next-generation nanodevices based on ferroelectrics. The knowledge about the structure and properties of ferroelectric DWs not only advances the fundamental understanding of ferroelectrics, but also provides guidance for the design of ferroelectric-based devices. In this article, we provide a review of structures and properties of DWs in one of the most widely studied ferroelectric systems, BiFeO3 thin films. We correlate their conductivity and photovoltaic properties to the atomic-scale structure and dynamic behaviors of DWs.