Study on thickness uniformity of Ta2O5 film evaporated on the inner-face of a hemispherical substrate

• 作者: XU Lingmao HE Yanchun LI Kun ZHOU Hui XIONG Yuqing
• 来源期刊: 光电子快报（英文版）
• 年，卷（期）: 2021,（11）
• 所属期刊栏目: Materials
• 页码范围: 673-677
• 页数: 5页
• 语种: 英文
• DOI: 10.1007/s11801-021-1040-3

摘要

Theoretical analysis and experimental study on the thickness distribution of Ta2O5 film evaporated on the inner-face of a hemispherical substrate are demonstrated.It is derived that the value of n/R and L/R influence the film thickness dis-tribution(where R is the radius of the hemisphere,n and L are the horizontal distance and vertical height between the evaporation source and the center of the hemisphere,respectively).The whole hemispherical substrate can be coated when n≤L+R,otherwise there is a"blind area"on the substrate when the substrate is self-rotating.A hemispherical composite substrate with a radius of 200 mm is coated with Ta2O5 protective film under a certain configuration,the thickness of Ta2O5 film at the edge is 0.372 times the film at the vertex which shows that the evaporation characteris-tics of Ta2O5 tend to be a point source.