A High Sensitive Etching Set-up

• 作者: DuanJiaglai ZhuZhiyong SunYoumei, WangZhiguang JinYunfan HouMingdong LiuJie ZhangChonghong ZhaoZhiming SongYin WangYing
• 来源期刊: 近代物理研究所和兰州重离子加速器实验室年报：英文版
• 学科: 工学
• 关键词: 高灵敏度蚀剂装置 化学蚀刻放大技术 实验设计 重离子 温度控制器
• 年，卷（期）: 2002,（1）
• 页码范围: 112
• 页数: 1页
• 分类号: TL503

摘要

<正> The interaction of heavy ions with solids produces a latent track of primary damage along ion path. In order to study some problems about the track cores, we must reveal and enlarge the cores by chemical etching. To acquire a very small pore, a high sensitive etching set-up is required.Our lab devised a high sensitive etching system in 2002. Fig.1 shows the diagram of the experimental setup. The set-up is composed of four parts: temperature controller, etching trough, electricity supplier and