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摘要:
The Epitaxial GaN thin films have been fabricated by Ion Beam Assisted Deposition (IBAD) process using nitrogen ions with hyperthermal energies on the polyimides polymer substrates. By applying with the Reflection of High-Energy Electron Diffraction (RHEED), Scanning Electron Microscopy (SEM) and Quantum Design Physical Properties Measurement System, the behaviour of hexagonal GaN thin films is investigated. The result showed that the high quality of the deposited GaN layers kept appearing for many parameters depending on the temperature greatly. The behaviour of high quality of epitaxial GaN coating on the polyimide polymer substrates is a promising material for optoelectronic devices and semiconductor devices application.
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篇名 Structural Characterization of Thin Epitaxial GaN Films on Polymer Polyimides Substrates by Ion Beam Assisted Deposition
来源期刊 材料物理与化学进展(英文) 学科 工学
关键词 Ion Beam Assisted Deposition Hexagonal GaN Thin Film SEM Quantum Design Physical Properties Measurement System RHEED
年,卷(期) 2020,(9) 所属期刊栏目
研究方向 页码范围 199-206
页数 8页 分类号 TN3
字数 语种
DOI
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节点文献
Ion
Beam
Assisted
Deposition
Hexagonal
GaN
Thin
Film
SEM
Quantum
Design
Physical
Properties
Measurement
System
RHEED
研究起点
研究来源
研究分支
研究去脉
引文网络交叉学科
相关学者/机构
期刊影响力
材料物理与化学进展(英文)
月刊
2162-531X
武汉市江夏区汤逊湖北路38号光谷总部空间
出版文献量(篇)
71
总下载数(次)
0
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0
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