Performance of Double-Pole Four-Throw Double-Gate RF CMOS Switch in 45-nm Technology

• 作者: Viranjay M. Srivastava
• 来源期刊: 无线工程与技术(英文)
• 学科: 工学
• 关键词: 45-nm TECHNOLOGY Capacitance of DOUBLE-GATE MOSFET DG MOSFET DP4T SWITCH Radio Frequency RF SWITCH Resistance of DOUBLE-GATE MOSFET VLSI
• 年，卷（期）: 2010,（2）
• 页码范围: 47-54
• 页数: 8页
• 分类号: TN3

摘要

In this paper, we have investigated the design parameters of RF CMOS switch, which will be used for the wireless tele-communication systems. A double-pole four-throw double-gate radio-frequency complementary-metal-oxide-semicon- ductor (DP4T DG RF CMOS) switch for operating at the 1 GHz is implemented with 45-nm CMOS process technology. This proposed RF switch is capable to select the data streams from the two antennas for both the transmitting and receiving processes. For the development of this DP4T DG RF CMOS switch we have explored the basic concept of the proposed switch circuit elements required for the radio frequency systems such as drain current, threshold voltage, resonant frequency, return loss, transmission loss, VSWR, resistances, capacitances, and switching speed.