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摘要:
InAs/GaSb type-II superlattce (T2SL) photodetector structures at the MWIR regime were grown by molecular beam epitaxy. The growth temperature and group-V soaking times were optimized with respect to interface and transport quality. Novel strain compensation schemes with insertion of InSb layers were proposed and tested to be efficient to tune the overall strain between tensile and compressive without degradation of interface and optical quality. The effect of the proposed methods is modeled by analytic functions.? Band structure calculations were also carried out for the proposed T2SL structures to assist optimizing sample designs. Single pixel photodiodes with a low dark current were demonstrated.
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篇名 Growth Optimization, Strain Compensation and Structure Design of InAs/GaSb Type-II Superlattices for Mid-Infrared Imaging
来源期刊 晶体结构理论与应用(英文) 学科 工学
关键词 INAS/GASB TYPE-II Superlattce Molecular Beam EPITAXY Strain COMPENSATION
年,卷(期) 2013,(2) 所属期刊栏目
研究方向 页码范围 46-56
页数 11页 分类号 TN3
字数 语种
DOI
五维指标
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INAS/GASB
TYPE-II
Superlattce
Molecular
Beam
EPITAXY
Strain
COMPENSATION
研究起点
研究来源
研究分支
研究去脉
引文网络交叉学科
相关学者/机构
期刊影响力
晶体结构理论与应用(英文)
季刊
2169-2491
武汉市江夏区汤逊湖北路38号光谷总部空间
出版文献量(篇)
80
总下载数(次)
0
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0
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