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摘要:
GaAs/In bilayers were prepared by RF Magnetron Sputtering in an Ar atmosphere on Si (100) substrates using high purity (95.95%) GaAs (100) and In targets. The growth temperatures were 300oC and 580oC for the high purity targets of In and GaAs, respectively. Three samples were prepared: the deposition time (td) for the GaAs layers was fixed to 30 minutes, while varied for the In layers from td = 10, 15, and 20 minutes. The morphological and optical studies of the samples were made by means of Amplitude Modulation Atomic Force Microscopy (AM-AFM). In order to analyze and correlate surface morphology and alloy composition properties, the as-prepared samples were cleaved along the [001] direction and subsequently studied by AM-AFM-micrographs. From topographic images, a statistical study of the roughness and grain size was made. Additionally, cross sectional AM-AFM-micrographs were performed for each sample, where the phase channel, which is sensitive to the material properties of the specimen, was of particular interest.
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篇名 Atomic Force Microscopy Studies on GaAs/In Bilayers Deposited on Si (100)
来源期刊 显微镜研究(英文) 学科 医学
关键词 INGAAS MAGNETRON SPUTTERING AFM
年,卷(期) 2015,(1) 所属期刊栏目
研究方向 页码范围 6-16
页数 11页 分类号 R73
字数 语种
DOI
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研究主题发展历程
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INGAAS
MAGNETRON
SPUTTERING
AFM
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相关学者/机构
期刊影响力
显微镜研究(英文)
季刊
2329-3306
武汉市江夏区汤逊湖北路38号光谷总部空间
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34
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0
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